Plasma Polymerized Thin Films Materials: Synthesis, Characterization, and Application Tests

Organic–inorganic hybrid co-polymer thin films were deposited on silicon(100) substrates under the several ratio of TEOS (tetraethoxysilane) against cyclohexene by plasma enhanced chemical vapour deposition (PECVD) method. Toluene and TEOS were utilized as organic and inorganic precursors each, and hydrogen and argon were also used as a bubbler and carrier gases, respectively. In order to compare the difference of the electrical and the mechanical properties of the plasma polymerized thin films, we grew the hybrid co-polymer thin films under the conditions of various ratio between cyclohexene and TEOS with fixed RF (radio frequency using 13.56 MHz) powers at 60 W. The as-grown polymerized thin films were in first analyzed by FT-IR and XPS. The result of FT-IR showed that the co-polymer thin films were polymerized with fragmented each precursor. Also, XPS results showed the chemical species and binding energies of each species. Si 2p core-level spectra from the hybrid polymer thin film showed the status of Si oxidation number. Impedance analyzer was utilized for the measurements of I–V curves and capacitance values.